| 摘要: |
| 针对微晶玻璃材料系统研究了加工时间、作用距离以及入射角度对去除函数的影响。实验及分析结果表明：加工时间及作用距离与去除效率呈线性关系；随着入射角的增大，理论与实际去除率偏差也随之增大，在入射角为0o～60o时，去除率偏差值变化范围为1.43%至3.38%，总体上仍小于5%的误差指标，满足非球面离子束超精密抛光的需求。 |
| 关键词: 去除特性 三轴离子束系统 归一化去除效率 |
| 基金项目: |
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| The Removal Characteristics of Ion Beam Polishing Optical Elements |
|
Wang Yonggang Xiao Zhenghang Wang Peng
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Beijing Institute of Space and Mechanics, Beijing 100076
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| Abstract: |
| The effect of working time, working distance and incident angle on removal characteristics were investigated comprehensively in this paper. It indicates that the removal rate varied linearly with increasing working time and working distance. And as the incidence angle increasing from 0o to 60o, the deviation of removal rate was also increased from 1.43% to 3.38% gradually. All of them make the basic condition for polishing aspheric mirrors determinedly with IBF. |
| Key words: removal characteristics three-axis IBF system normalized removal rate |
