摘要: |
针对磁控溅射工艺参数溅射功率、沉积时间(薄膜厚度)、基底温度对半球谐振子表面金属薄膜残余应力的影响情况进行工艺实验研究,通过X射线衍射法测试其应力,在保证金属薄膜低残余应力的基础上得到最优工艺参数:溅射速率0.9nm/s,沉积时间111s(薄膜厚度100nm),基底温度75℃。根据最优参数组合得到厚度100nm的金属薄膜,通过拉力测试实验,胶带在从薄膜表面拉开的过程中剥离强度为2.81N/cm2,大于2.74N/cm2,未出现薄膜剥落现象,满足光学薄层通用规范的国家标准。 |
关键词: 半球谐振陀螺;谐振子镀膜;Q值;残余应力;磁控溅射 |
基金项目: |
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Preparation of Low Damping Loss Metalized Thin Films for Hemispherical Fesonators |
Qin Lin Zhu Beibei Lan Jie Cheng Hui Yang Yingjie Wu Yuhang
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Shanghai Aerospace Control Technology Research Institute, Shanghai 201109
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Abstract: |
In this paper, the magnetron sputtering parameters will be researched, such as magnetron sputtering power, deposition time (film thickness) and the effects of substrate temperature on the residual stress of metal films on the surface of resonator. On the basis of low residual stress of the metal film, the optimal process parameters are obtained by X-ray diffraction method: the deposition rate of 0.9nm/s, the deposition time of 111s (the film thickness is 100nm), and the substrate temperature of 75℃. According to combination of the optimal parameter, a metal film with 100nm thickness was obtained, the peel strength of the tape is 2.81N/cm2 in the process of pulling away from the film surface by tensile tests, which was greater than 2.74N/cm2. The results meet the national standard of the general specification for optical film layers. |
Key words: hemispherical resonant gyroscope;resonator coating;quality factor value;residual stress;magnetron sputtering |